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Localized thermoelectric "self cooling" in semiconductor materials is among the most promising approaches for the remediation of on-chip hot spots resulting from the shrinking feature sizes and faster switching speeds of nanoelectronic components. Self cooling in a germanium chip is investigated, using 3-dimensional, thermal-electric, coupled numerical simulations, for a range of systems and geometric parameters. The results suggest that localized cooling, associated with the introduction of an electric current on the back surface of a germanium chip, can effectively reduce the hot spot temperature rise on the active side of the chip. It was found that self cooling in a 100μm thick chip could provide between 3.9°C and 4.5°C hotspot temperature reduction. When using a germanium layer above an electrically insulated silicon layer, self-cooling was found to yield an additional 1°C to 2°C temperature reduction. A streamlined computational tool is developed to facilitate the identification of optimal cooling parameters.
Advisor: | Bar-Cohen, Avram |
Commitee: | McCluskey, Patrick, Yang, Bao |
School: | University of Maryland, College Park |
Department: | Mechanical Engineering |
School Location: | United States -- Maryland |
Source: | MAI 50/01M, Masters Abstracts International |
Source Type: | DISSERTATION |
Subjects: | Mechanical engineering |
Keywords: | Electronic cooling, Heat transfer, Hot spots, Self cooling, Thermoelectric |
Publication Number: | 1495729 |
ISBN: | 978-1-124-74332-5 |