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The monolithic integration of dissimilar microsystems is often limited by conflicts in thermal budget. One of the most prevalent examples is the fabrication of active micro-electromechanical systems (MEMS), as structural films utilized for surface micromachining such as polysilicon typically require processing at temperatures unsuitable for microelectronic circuitry. A localized annealing process could provide for the post-deposition heat treatment of integrated structures without compromising active devices. This dissertation presents a new microfabrication technology based on the inductive heating of ferromagnetic films patterned to define regions for heat treatment. Support is provided through theory, finite-element modeling, and experimentation, concluding with the demonstration of inductive annealing on polysilicon inertial sensing structures. Though still in its infancy, the results confirm the technology to be a viable option for integrated MEMS as well as any microsystem fabrication process requiring a thermal gradient.
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School: | Michigan Technological University |
School Location: | United States -- Michigan |
Source: | DAI-B 68/03, Dissertation Abstracts International |
Source Type: | DISSERTATION |
Subjects: | Electrical engineering, Materials science |
Keywords: | Annealing, Ferromagnetic, Films, Polysilicon |
Publication Number: | 3258015 |