Dissertation/Thesis Abstract

Phase Stability in Metallic Multilayers
by Genc, Arda, Ph.D., The Ohio State University, 2008, 199; 10630965
Abstract (Summary)

As the thin film materials used in electronic and optical applications continue to decrease in thickness to the nanoscales, marked changes in functional properties are expected to occur due to changes in crystal structure of these materials. Therefore, such multilayer systems have been of considerable interest due to the ability to control properties by engineering the structure of materials at the nanoscales.

The new characterization tools allow direct imaging and analysis of such materials in order to link the performance variations with the crystal structure variations. Recently, there have been remarkable advances in aberration corrected column design of electron microscopes, which eventually led to sub-Angstrom (< 0.1nm) resolution imaging of the materials through parallel and/or spot illumination modes. In the latest literature, the capability of aberration corrected microscopy in 2D imaging of the unique material properties has been successfully addressed and unfortunately few work been conducted on the possible analytical applications of this technique. Here we have explored the benefits of using an aberration corrected probe in both imaging and quantitative microanalysis of nanoscale metallic multilayers and addressed the phase stability in Cu/Nb, Ti/Nb and Co/Cr nanoscale metallic multilayers by the extensive usage of these advance characterization techniques.

Indexing (document details)
Advisor: Fraser, Hamish
Commitee: Clark, William, Mills, Michael
School: The Ohio State University
Department: Materials Science and Engineering
School Location: United States -- Ohio
Source: DAI-B 78/11(E), Dissertation Abstracts International
Subjects: Engineering
Keywords: Aberration corrected tem, Phase stability, Thin films
Publication Number: 10630965
ISBN: 978-0-355-01283-5
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